Nanostructure Thin Films Prepared by Using PLD and SILAR Method

There are several types of binary, ternary and quaternary thin films have been prepared using pulsed
laser deposition (PLD) and successive ion layer adsorption and reaction (SILAR) method. These
methods have many advantages such as able to control the dimensions, the growth rate, film
thickness and produce nano-particles. In this work, PLD and SILAR methods were briefly discussed.
Experimental results for the films prepared using these two deposition techniques from literature
review will be described. Characterization of thin films using various tools (SEM, EDAX, XRD, XPS,
FTIR, UV-Visible spectrophotometer, Raman Spectra) showed these deposition techniques were
suitable to prepare metal chalcogenide thin films.