Monfortinho Thermal Water-Based Creams: Effects on Skin Hydration, Psoriasis, and Eczema in Adults

Almeida, Cristina and Madeira, Ana and Marto, Joana and Graça, Angélica and Pinto, Pedro and Ribeiro, Helena (2019) Monfortinho Thermal Water-Based Creams: Effects on Skin Hydration, Psoriasis, and Eczema in Adults. Cosmetics, 6 (3). p. 56. ISSN 2079-9284

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Abstract

The use of mineral water for therapeutic purposes has varied from century to century and from country to country. Its effectiveness depends on the individual experiences of the population and their cultural traditions. Usually, the waters recommended for dermatological treatment are hot springs that contain sulfur or more recently, silicon. The mechanisms by which mineral waters actuate in dermatological disorders are still not clear but it is believed that they involve thermal, mechanical, chemical, immunologic, and anti-oxidant reactions and enzymatic activity. The aim of this study is to characterize the thermal waters of Monfortinho, one of the oldest Portuguese spas, their potential use for the preparation of dermatological formulations (creams), and their effectiveness on the treatment of skin disorders (psoriasis and eczema). To accomplish this, cream formulations with different contents of thermal water were developed. The formulations were characterized in terms of thermal water analysis and physicochemical properties and their effects were studied by skin biometrics in adults (mean age of 54.3 years old) through skin hydration evaluation and evaluated in clinical studies on 22 patients with psoriasis and eczema. The results showed that all the formulations improved the skin hydration and have beneficial effects in relieving the symptoms of psoriasis and other disorders, but no significant differences were observed when thermal water was used (compared to laboratory ultra-pure water).

Item Type: Article
Subjects: Journal Eprints > Medical Science
Depositing User: Managing Editor
Date Deposited: 13 Feb 2023 09:45
Last Modified: 06 Jul 2024 06:32
URI: http://repository.journal4submission.com/id/eprint/910

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